Patent · US Active

Multiple nozzle gas cluster ion beam system

US8981322B2 · kind B2 · utility

2Cited by
15References
58Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 23, 2009
Grant dateMar 17, 2015
Priority date
Expiry dateDec 4, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/0827
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.