Precursor delivery system
US8986456B2 · kind B2 · utility
528Cited by
149References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2010 |
| Grant date | Mar 24, 2015 |
| Priority date | — |
| Expiry date | Sep 28, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A precursor source vessel for providing vaporized precursor to a reaction chamber is provided. The precursor source vessel includes a lid having a first port, a second port, and a third port. The precursor source vessel also includes a base removably attached to the lid. The base includes a recessed region formed therein. One of the first, second, and third ports is a burp port configured to relieve the head pressure within the source vessel after the source vessel is installed but prior to use of the source vessel in semiconductor processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.