Contact power rail
US8987816B2 · kind B2 · utility
5Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2014 |
| Grant date | Mar 24, 2015 |
| Priority date | — |
| Expiry date | Oct 21, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/981
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming CA power rails using a three mask decomposition process and the resulting device are provided. Embodiments include forming a horizontal diffusion CA power rail in an active layer of a semiconductor substrate using a first color mask; forming a plurality of vertical CAs in the active layer using second and third color masks, the vertical CAs connecting the CA power rail to at least one diffusion region on the semiconductor substrate, spaced from the CA power rail, wherein each pair of CAs formed by one of the second and third color masks are separated by at least two pitches.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.