Patent · US Active

Micro-electromechanical system devices

US8993394B2 · kind B2 · utility

0Cited by
10References
12Claims
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Assignee

Inventors

Key dates

Filing dateNov 26, 2012
Grant dateMar 31, 2015
Priority date
Expiry dateNov 26, 2032

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2203/0742
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Micro-electromechanical system (MEMS) devices and methods of manufacture thereof are disclosed. In one embodiment, a MEMS device includes a semiconductive layer disposed over a substrate. A trench is disposed in the semiconductive layer, the trench with a first sidewall and an opposite second sidewall. A first insulating material layer is disposed over an upper portion of the first sidewall, and a conductive material disposed within the trench. An air gap is disposed between the conductive material and the semiconductive layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.