Electrostatic chuck AlN dielectric repair
US9001489B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2012 |
| Grant date | Apr 7, 2015 |
| Priority date | — |
| Expiry date | May 30, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49746
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention generally relates to a refurbished electrostatic chuck and a method of refurbishing a used electrostatic chuck. Initially, a predetermined amount of dielectric material is removed from the used electrostatic chuck to leave a base surface. Then, the base surface is roughened to enhance the adherence of new dielectric material thereto. The new dielectric material is then sprayed onto the roughened surface. A mask is then placed over the new dielectric material to aid in the formation of mesas upon which a substrate will sit during processing. A portion of the new dielectric layer is then removed to form new mesas. After removing the mask, edges of the mesas may be smoothed and the refurbished electrostatic chuck is ready to return to service after cleaning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.