Patent · US Active

Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system

US9005414B2 · kind B2 · utility

0Cited by

0References

21Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Andreas Lopp · Neuses, DE
Juergen GRILLMAYER · Frankfurt, DE
Wolfgang Krock · Niederrodenbach, DE

Key dates

Filing date	Jul 20, 2010
Grant date	Apr 14, 2015
Priority date	—
Expiry date	Apr 16, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3461
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The disclosure relates to a magnet arrangement for a sputtering system, wherein the magnet arrangement is adapted for a rotatable target of a sputtering system and includes: a first magnet element extending along a first axis; a second magnet element being disposed around the first magnet element symmetrically to a first plane; wherein the second magnet element includes at least one magnet section intersecting the first plane; and wherein a magnetic axis of the at least one magnet section is inclined with respect to a second plane being orthogonal to the first axis. Further, the disclosure relates to a target backing tube for a rotatable target of a sputtering system, a cylindrical rotatable target for a sputtering system, and a sputtering system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.