Eliminating shorting between ferroelectric capacitors and metal contacts during ferroelectric random access memory fabrication
US9006808B2 · kind B2 · utility
0Cited by
12References
19Claims
0Family size
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Key dates
| Filing date | Jun 12, 2014 |
| Grant date | Apr 14, 2015 |
| Priority date | — |
| Expiry date | Jun 12, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/682
Abstract
Disclosed herein is an apparatus that includes a ferrocapacitor having a sidewall. An etch stopping film is disposed along the sidewall of the ferrocapacitor, with a hydrogen barrier film disposed between the etch stopping film and the sidewall of the ferrocapacitor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.