Patent · US Active

Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus

US9007563B2 · kind B2 · utility

1Cited by

6References

28Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Deguenther · Aalen, DE
Michael Layh · Altusried, DE

Key dates

Filing date	Feb 23, 2010
Grant date	Apr 14, 2015
Priority date	—
Expiry date	Jan 27, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70116
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.