Patent · US Active

Process chamber component having yttrium—aluminum coating

US9012030B2 · kind B2 · utility

28Cited by
93References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 7, 2012
Grant dateApr 21, 2015
Priority date
Expiry dateMay 2, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/12806
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.