Positive photosensitive material

US9012126B2 · kind B2 · utility

Assignee

• AZ Electronic Materials (Luxembourg) S.A.R.L. · LU

Inventors

• Weihong Liu · Carp, CA
• PingHung Lu · Bound Brook, US
• Chunwei Chen · Piscataway, US
• Stephen Meyer · Saylorsburg, US
• Medhat A. Toukhy · Barrington, US
• SookMee Lai · Kakegawa, JP

Key dates

• Filing date: Jun 15, 2012
• Grant date: Apr 21, 2015
• Expiry date: Jun 15, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0397
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula:wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.