Photoresist and coated substrate comprising same
US9012128B2 · kind B2 · utility
3Cited by
2References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 11, 2013 |
| Grant date | Apr 21, 2015 |
| Priority date | — |
| Expiry date | Nov 11, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/387
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A polymer includes the polymerized product of monomers including a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II):wherein a, L1, LN, Ra, Rb, Rc, and X are defined herein. The polymer is a useful component of a photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.