Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US9013672B2 · kind B2 · utility
0Cited by
75References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2007 |
| Grant date | Apr 21, 2015 |
| Priority date | — |
| Expiry date | May 27, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.