Patent · US Active

Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system

US9019466B2 · kind B2 · utility

3Cited by
19References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 27, 2007
Grant dateApr 28, 2015
Priority date
Expiry dateAug 27, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70341
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.