Patent · US Active

Projection exposure apparatus for semiconductor lithography including an actuator system

US9030644B2 · kind B2 · utility

0Cited by

7References

25Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Benjamin Sigel · Aalen, DE
Andreas Bertele · Oberkochen, DE
Peter Kloesch · Oberkochen, DE
Martin Mahlmann · Heidenheim, DE
Jochen Weber · Laufenbürg, DE

Key dates

Filing date	Aug 2, 2011
Grant date	May 12, 2015
Priority date	—
Expiry date	Jul 9, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/709
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.