Benjamin Sigel
3Patents
0h-index
9Co-inventors
27Inventor score
Filing activity: Feb 4, 2011 → Feb 23, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9030644B2 | Projection exposure apparatus for semiconductor lithography including an actuator system | Physics | 0 | Active |
| US9964673B2 | Optical system with aperture device having plurality of aperture elements | Physics | 0 | Active |
| US9851555B2 | Optical component | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.