Patent · US Active

Using chemical vapor deposited films to control domain orientation in block copolymer thin films

US9040121B2 · kind B2 · utility

0Cited by

14References

14Claims

0Family size

Assignee

The Board of Regents of the University of Texas System · US

Inventors

C. Grant Willson · Austin, US
William J. Durand · San Francisco, US
Christopher John Ellison · Austin, US
Christopher M. Bates · Austin, US
Takehiro Seshimo · Kawasaki, JP
Julia Cushen · San Francisco, US
Logan J. Santos · Austin, US
Leon Dean · Spokane, US
Erica L. Rausch · Austin, US

Key dates

Filing date	Feb 7, 2013
Grant date	May 26, 2015
Priority date	—
Expiry date	Feb 7, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31931
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

Vacuum deposited thin films of material are described to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.