Dielectric doping using high productivity combinatorial methods
US9040465B2 · kind B2 · utility
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Key dates
| Filing date | Nov 19, 2012 |
| Grant date | May 26, 2015 |
| Priority date | — |
| Expiry date | Jul 9, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/00756
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A combination of deposition processes can be used to evaluate layer properties using a combinatorial workflow. The processes can include a base ALD process and another process, such as a PVD process. The high productivity combinatorial technique can provide an evaluation of the material properties for given ALD base layer and PVD additional elements. An ALD process can then be developed to provide the desired layers, replacing the ALD and PVD combination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.