Prashant B. Phatak
90Patents
11h-index
42Co-inventors
74Inventor score
Filing activity: Sep 29, 2000 → May 26, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8183553B2 | Resistive switching memory element including doped silicon electrode | Electricity | 127 | Active |
| US7629198B2 | Methods for forming nonvolatile memory elements with resistive-switching metal oxides | Electricity | 98 | Active |
| US8294219B2 | Nonvolatile memory element including resistive switching metal oxide layers | Electricity | 31 | Active |
| US8072795B1 | Biploar resistive-switching memory with a single diode per memory cell | Physics | 23 | Active |
| US7960216B2 | Confinement techniques for non-volatile resistive-switching memories | Electricity | 19 | Active |
| US8766234B1 | Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks | Electricity | 17 | Active |
| US7824935B2 | Methods of combinatorial processing for screening multiple samples on a semiconductor substrate | Electricity | 15 | Active |
| US8420478B2 | Controlled localized defect paths for resistive memories | Electricity | 15 | Active |
| US8062918B2 | Surface treatment to improve resistive-switching characteristics | Electricity | 14 | Active |
| US8129704B2 | Non-volatile resistive-switching memories | Electricity | 14 | Active |
| US8053364B2 | Closed-loop sputtering controlled to enhance electrical characteristics in deposited layer | Electricity | 12 | Active |
| US8981327B1 | Carbon-doped silicon based selector element | Electricity | 11 | Active |
| US8008096B2 | ALD processing techniques for forming non-volatile resistive-switching memories | Electricity | 11 | Active |
| US8551809B2 | Reduction of forming voltage in semiconductor devices | Electricity | 9 | Active |
| US8097878B2 | Nonvolatile memory elements with metal-deficient resistive-switching metal oxides | Electricity | 9 | Active |
| US8465996B2 | Surface treatment to improve resistive-switching characteristics | Electricity | 7 | Active |
| US8049305B1 | Stress-engineered resistance-change memory device | Electricity | 7 | Active |
| US8872151B2 | Surface treatment to improve resistive-switching characteristics | Electricity | 6 | Active |
| US8975610B1 | Silicon based selector element | Electricity | 6 | Active |
| US7977152B2 | Non-volatile resistive-switching memories formed using anodization | Electricity | 6 | Active |
| US8298891B1 | Resistive-switching memory element | Electricity | 5 | Active |
| US9362497B2 | Reduction of forming voltage in semiconductor devices | Electricity | 5 | Active |
| US7968452B2 | Titanium-based high-K dielectric films | Emerging Cross-Sectional Technologies | 5 | Active |
| US8318534B2 | Non-volatile resistive-switching memories formed using anodization | Electricity | 5 | Active |
| US8654560B2 | Variable resistance memory with a select device | Electricity | 5 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.