Shadow mask held magnetically on a substrate support

US9045818B2 · kind B2 · utility

Assignee

• AIXTRON SE · DE

Inventors

• Markus Gersdorff · Salzburg, AT
• Walter Franken · Eschweiler, DE
• Arno Offermanns · Aldenhoven, DE

Key dates

• Filing date: Sep 23, 2009
• Grant date: Jun 2, 2015
• Expiry date: Nov 4, 2030

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K71/166
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a device for depositing laterally structured layers on a substrate (2) situated on a substrate support (1), using a shadow mask (3) lying flat on the substrate surface (2′) to be coated, the substrate support (1) having first magnetic zones (4) for magnetically attracting second magnetic zones (5) of the shadow mask (3) that are associated with these first magnetic zones (4), wherein, before coating the substrate (2) and when the shadow mask (3) is lying on the substrate (2), the first magnetic zones (4) may be brought into an active position in which the second magnetic zones (5) are drawn toward the substrate surface (2′), and, for placement or removal of the shadow mask (3), the first magnetic zones may be brought into an inactive position in which the attractive force acting on the second magnetic zones (5) is reduced. It is important that the first magnetic zones (4) are formed from magnetic elements, in particular permanent magnetic elements, situated in recesses (6) in a substrate support surface (1′) of the substrate support (1), which are spatially associated with the second magnetic zones (5).