High electron energy based overlay error measurement methods and systems
US9046475B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2011 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | Jun 14, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/611
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method, a system and a computer readable medium are provided. The method may include obtaining or receiving first area information representative of a first area of a first layer of an inspected object; wherein the inspected object further comprises a second layer that comprises a second area; wherein the second layer is buried under the first layer; directing electrons of a primary electron beam to interact with the first area; directing electrons of the primary electron beam to interact with the second area; generating detection signals responsive to electrons that were scattered or reflected from at least one of the first and second areas; and determining at least one spatial relationship between at least one feature of the first area and at least one feature of the second area based on the detection signals and on the first area information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.