Exposure apparatus and device fabrication method
US9046790B2 · kind B2 · utility
1Cited by
67References
69Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 7, 2013 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | Mar 7, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member having a supply outlet that supplies a liquid and a collection inlet that collects a liquid, and a vibration isolating mechanism that supports the nozzle member and vibrationally isolates the nozzle member from a lower side step part of a main column.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.