Cleaning module, EUV lithography device and method for the cleaning thereof

US9046794B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Stefan Hembacher · Bobingen, DE
• Dieter Kraus · Munich, DE
• Dirk Heinrich Ehm · Beckingen, DE
• Stefan Schmidt · Aalen, DE
• Stefan Koehler · Eppelheim, DE
• Almut Czap · Aalen, DE
• Stefan Wiesner · Lauchheim, DE
• Hin Yiu Anthony Chung · Blaustein, DE

Key dates

• Filing date: Sep 16, 2010
• Grant date: Jun 2, 2015
• Expiry date: May 5, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70925
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).