Almut Czap
6Patents
2h-index
25Co-inventors
47Inventor score
Filing activity: Sep 16, 2010 → Dec 4, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9046794B2 | Cleaning module, EUV lithography device and method for the cleaning thereof | Physics | 2 | Active |
| US8477285B2 | Particle cleaning of optical elements for microlithography | Physics | 2 | Active |
| US8885141B2 | EUV lithography device and method for processing an optical element | Physics | 1 | Active |
| US9025128B2 | Actuator including magnet for a projection exposure system and projection exposure system including a magnet | Electricity | 0 | Active |
| US11678979B2 | Eye implant for an accommodative intraocular lens | Human Necessities | 0 | Active |
| US10039177B2 | Source hollow body and EUV plasma light source comprising such a source hollow body | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.