Patent · US Active

Dielectric window for plasma treatment device, and plasma treatment device

US9048070B2 · kind B2 · utility

2Cited by
3References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 8, 2012
Grant dateJun 2, 2015
Priority date
Expiry dateNov 8, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32238
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A dielectric window for a plasma treatment device for a plasma treatment device that uses microwaves as a plasma source. The dielectric window is circular-plate-shaped and allows microwaves to propagate. The dielectric window has a recess that has an opening on the lower-surface side and that indents in the plate thickness direction of the dielectric window, and is provided to the lower surface at which plasma is generated when the dielectric window is provided to the plasma treatment device. The recess has a bottom surface extending in the direction perpendicular to the plate thickness direction, and a side surface extending in the plate thickness direction from the circumferential edge of the bottom surface toward the opening of the recess. In addition, an inclined surface extends at an incline relative to the plate thickness direction from the opening-side circumferential edge of the side surface toward the opening of the recess.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.