Method of fabricating optical devices using laser treatment
US9048170B2 · kind B2 · utility
25Cited by
87References
24Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 9, 2010 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | Apr 4, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/0364
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for forming optical devices. The method includes providing a gallium nitride substrate member having a crystalline surface region and a backside region. The method also includes subjecting the backside region to a laser scribing process to form a plurality of scribe regions on the backside region and forming a metallization material overlying the backside region including the plurality of scribe regions. The method removes at least one optical device using at least one of the scribe regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.