Compositions of neutral layer for directed self assembly block copolymers and processes thereof

US9052598B2 · kind B2 · utility

Assignee

• AZ Electronic Materials (Luxembourg) S.A.R.L. · LU

Inventors

• Hengpeng Wu
• Yi Cao · Parsippany, US
• SungEun Hong · Berkeley Heights, US
• Jian Yin · Bound Brook, US
• Margareta Paunescu · Clinton, US
• Mark Neisser · Whitehouse Station, US
• Guanyang Lin · Whitehouse Station, US

Key dates

• Filing date: Feb 14, 2014
• Grant date: Jun 9, 2015
• Expiry date: Feb 14, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/2037
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

The present invention relates to novel processes for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The processes are useful for fabrication of electronic devices. The novel processes comprise a step of forming a coating of the neutral layer from the neutral layer composition, wherein the neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3)where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.