Patent · US Active

Silicon carbide single crystal and manufacturing method of the same

US9053834B2 · kind B2 · utility

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2References
8Claims
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Key dates

Filing dateJul 29, 2011
Grant dateJun 9, 2015
Priority date
Expiry dateJan 16, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B31/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A silicon carbide single crystal includes nitrogen as a dopant and aluminum as a dopant. A nitrogen concentration is 2×1019 cm−3 or higher and a ratio of an aluminum concentration to the nitrogen concentration is within a range of 5% to 40%.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.