Patent · US Active

Substrate transfer equipment and high speed substrate processing system using the same

US9054146B2 · kind B2 · utility

8Cited by
5References
31Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMay 1, 2007
Grant dateJun 9, 2015
Priority date
Expiry dateMar 18, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S901/30
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

There are provided a substrate transferring apparatus for continuously loading/unloading a plurality of substrates in and from a process chamber to reduce time spent on transferring the substrates and to improve productivity and a substrate processing system using the same. The substrate transfer apparatus is installed in the transfer chamber and transfers substrates between first and second process chambers which is positioned lateral sides of the transfer chamber and a load rock chamber. The substrate transfer apparatus includes a driving unit to supply a rotational force, a spindle connected to the driving unit, first swivel plate arms to load/unload substrate to/from first process chamber, and second swivel plate arms to load/unload substrate to/from second process chamber. Since substrates before and after being processed are rapidly exchanged during the simultaneous or continuous process of plural substrates, processing rate increases and overall productivity can be increased.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.