Ashing apparatus
US9059105B2 · kind B2 · utility
1Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 26, 2007 |
| Grant date | Jun 16, 2015 |
| Priority date | — |
| Expiry date | Oct 2, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed is an ashing apparatus and its method of manufacture wherein decrease in processing efficiency is suppressed. Specifically, a shower plate is arranged to face a substrate stage on which a substrate is placed, and diffuses oxygen radicals supplied into a chamber. A metal blocking plate is arranged between the shower plate and the substrate stage and has a through hole through which oxygen radicals pass. In addition, the metal blocking plate has a first layer, which is made of a metal same as the one exposed in the substrate, on the surface facing the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.