Bipolar semiconductor component with a fully depletable channel zone
US9064923B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 21, 2013 |
| Grant date | Jun 23, 2015 |
| Priority date | — |
| Expiry date | May 21, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
Abstract
A bipolar semiconductor component includes a semiconductor body having first and second substantially parallel main surfaces and at least one load pn junction, a first metallization on the first surface, a second metallization on the second surface, and a current path running in the semiconductor body from the first metallization to the second metallization only through n-doped zones, including between first and second p-doped zones which are in contact with the first metallization and spaced apart from one another by an n-doped channel zone through which the current path runs. A space charge region forms in the semiconductor body between the first and second p-doped zones to fully deplete the n-doped channel zone between the first and second p-doped zones and therefore prevent current flow between the first and second metallizations along the current path when a positive voltage is applied between the second metallization and the first metallization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.