Radio-frequency antenna unit and plasma processing apparatus
US9078336B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2009 |
| Grant date | Jul 7, 2015 |
| Priority date | — |
| Expiry date | Mar 6, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3211
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention aims at providing a radio-frequency antenna unit capable of generating a high-density discharge plasma in a vacuum chamber. The radio-frequency antenna unit according to the present invention includes: a radio-frequency antenna through which a radio-frequency electric current can flow; a protective tube made of an insulator provided around the portion of the radio-frequency antenna that is in the vacuum chamber; and a buffer area provided between the radio-frequency antenna and the protective tube. The “buffer area” refers to an area where an acceleration of electrons is suppressed, and it can be formed, for example, with a vacuum or an insulator. Such a configuration can suppress an occurrence of an electric discharge between the antenna and the protective tube, enabling the generation of a high-density discharge plasma in the vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.