Akinori Ebe
17Patents
4h-index
24Co-inventors
60Inventor score
Filing activity: Jun 4, 1992 → May 7, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6294479A | Film forming method and apparatus | Chemistry; Metallurgy | 17 | Expired |
| US5316802A | Method of forming copper film on substrate | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6620247B2 | Thin polycrystalline silicon film forming apparatus | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5501911A | Copper crystal film coated organic substrate | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7785441B2 | Plasma generator, plasma control method, and method of producing substrate | Electricity | 4 | Expired |
| US7880392B2 | Plasma producing method and apparatus as well as plasma processing apparatus | Electricity | 4 | Active |
| US6447850B1 | Polycrystalline silicon thin film forming method | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8917022B2 | Plasma generation device and plasma processing device | Electricity | 3 | Active |
| US6103321A | Method of manufacturing an ultraviolet resistant object | Performing Operations; Transporting | 3 | Expired |
| US5496772A | Method of manufacturing film carrier type substrate | Electricity | 2 | Expired |
| US8444806B2 | Plasma generator, plasma control method and method of producing substrate | Electricity | 2 | Active |
| US8916034B2 | Thin-film forming sputtering system | Electricity | 1 | Active |
| US11785701B2 | Plasma generator | Electricity | 0 | Active |
| US12354839B2 | Radio-frequency antenna and plasma processing device | Electricity | 0 | Active |
| US8931433B2 | Plasma processing apparatus | Chemistry; Metallurgy | 0 | Active |
| US9078336B2 | Radio-frequency antenna unit and plasma processing apparatus | Electricity | 0 | Active |
| US8419894B2 | Plasma generator, plasma control method and method of producing substrate | General | 0 | Revoked |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.