Patent · US Active

Method and apparatus for controlling a processing system

US9080576B2 · kind B2 · utility

0Cited by

2References

16Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Youssef A. Loldj · Sunnyvale, US
Jay J. Jung · Shrewsbury, US
Mehran Moalem · Cupertino, US
Paul Fisher · Brighton, US
Joshua Putz · Fairfield, US
Andreas Neuber · Stuttgart, DE

Key dates

Filing date	Jan 27, 2012
Grant date	Jul 14, 2015
Priority date	—
Expiry date	Apr 23, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T137/0396
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.