Patent · US Active

Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same

US9081310B2 · kind B2 · utility

1Cited by

9References

28Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Matthias Exler · Aalen, DE
Ulrich Loering · Schwäbisch Gmünd, DE
Toralf Gruner · Hennef (Sieg), DE
Holger Walter · Aalen, DE

Key dates

Filing date	Sep 6, 2012
Grant date	Jul 14, 2015
Priority date	—
Expiry date	Jun 24, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70341
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.