Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
US9082590B2 · kind B2 · utility
6Cited by
1References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2013 |
| Grant date | Jul 14, 2015 |
| Priority date | — |
| Expiry date | Jan 21, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor has an overhead multiple coil inductive plasma source with symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.