Patent · US Active

Method for predicting reliable lifetime of SOI mosfet device

US9086448B2 · kind B2 · utility

1Cited by
5References
5Claims
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Key dates

Filing dateNov 30, 2011
Grant dateJul 21, 2015
Priority date
Expiry dateJun 8, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R31/287
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for predicting a reliable lifetime of a SOI MOSFET device including: measuring a relationship of a gate resistance of the device varying as a function of a temperature at different wafer temperatures; performing a lifetime accelerating test on the device at different wafer temperatures, so as to obtain a degenerating relationship of a parameter representing the lifetime of the device as a function of stress time, and obtain a lifetime in the presence of self-heating when the parameter degenerates to 10%; performing a self-heating correction on the measured lifetime of the device by using the measured self-heating temperature and an Arrhenius model, so as to obtain a lifetime without self-heating influence; performing a self-heating correction on a variation of the drain current caused by self-heating; performing a self-heating correction on an impact ionization rate caused by hot carriers; and predicting the lifetime of the device under a bias.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.