Source collector, lithographic apparatus and device manufacturing method
US9091944B2 · kind B2 · utility
0Cited by
3References
18Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 24, 2010 |
| Grant date | Jul 28, 2015 |
| Priority date | — |
| Expiry date | Oct 20, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0025
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.