Patent · US Active

Cooling ring for physical vapor deposition chamber target

US9096927B2 · kind B2 · utility

5Cited by

8References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Brian T. West · San Jose, US
Goichi Yoshidome · Emeryville, US
Ralf Hofmann · Heidenheim, DE

Key dates

Filing date	Aug 14, 2012
Grant date	Aug 4, 2015
Priority date	—
Expiry date	Jan 2, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3497
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Apparatus and method for physical vapor deposition are provided. In some embodiments, a cooling ring to cool a target in a physical vapor deposition chamber may include an annular body having a central opening; an inlet port coupled to the body; an outlet port coupled to the body; a coolant channel disposed in the body and having a first end coupled to the inlet port and a second end coupled to the outlet port; and a cap coupled to the body and substantially spanning the central opening, wherein the cap includes a center hole.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.