System, method and computer program product for classification within inspection images
US9098893B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2011 |
| Grant date | Aug 4, 2015 |
| Priority date | — |
| Expiry date | Apr 19, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In accordance with an aspect of the presently disclosed subject matter, there is provided an analysis system for classifying possible defects identified within an inspection image of an inspected object, the system comprising a pattern matcher configured to determine an anchor location with respect to the inspection image, based on a matching of a template and a portion of the inspection image; wherein an accuracy of the determining of the anchor location exceeds a resolution of the inspection image; a distribution analysis module configured to determine, based on the anchor location and a mask which defines different segments within an area, a distribution of a potential defect with respect to one or more of the segments; and a classifier, configured to classify the potential defect based on the distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.