Patent · US Active

Focusing a charged particle imaging system

US9099282B2 · kind B2 · utility

18Cited by

13References

38Claims

0Family size

Assignee

Applied Materials Israel Ltd. · IL

Inventors

Steven R. Rogers · Ashdod, IL
Rainer Knippelmeyer · Utting am Ammersee, DE
Thomas Kemen · Meppen, DE
Stefan Schubert · Oberkochen, DE
Nissim Elmaliah · Raanana, IL

Key dates

Filing date	Mar 27, 2014
Grant date	Aug 4, 2015
Priority date	—
Expiry date	Mar 27, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one non-astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.