Patent · US Active

Geometries and patterns for surface texturing to increase deposition retention

US9101954B2 · kind B2 · utility

7Cited by

37References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Jianqi Wang · Fremont, US
William M. Lu · Sunnyvale, US
Yukari Nishimura · Sunnyvale, US
Joseph F. Sommers · San Jose, US
Sio On Lo · Milpitas, US
Rajan Balesan · Fremont, US

Key dates

Filing date	Sep 17, 2013
Grant date	Aug 11, 2015
Priority date	—
Expiry date	Sep 17, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24479
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.