Mask set for double exposure process and method of using the mask set
US9104833B2 · kind B2 · utility
4Cited by
7References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 26, 2014 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | May 26, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.