Lithographic apparatus comprising a substrate table and a surface substrate actuator
US9110387B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 2012 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | Jun 23, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70758
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.