Patent · US Active

Wafer processing utilizing a frame with a plurality of partitions

US9112019B2 · kind B2 · utility

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1References
1Claims
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Assignee

Inventors

Key dates

Filing dateNov 21, 2014
Grant dateAug 18, 2015
Priority date
Expiry dateNov 21, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wafer processing method for dividing a wafer into individual devices along a plurality of crossing division lines includes preparing a frame having a plurality of crossing partitions corresponding to the division lines of the wafer, spreading a liquid resin on the front side or back side of the wafer and positioning the partitions of the frame in alignment with the division lines of the wafer, thereby covering with the liquid resin the regions on the front side or back side of the wafer other than the regions corresponding to the division lines, curing the liquid resin supplied to the front side or back side of the wafer and next removing the frame, thereby masking the regions other than the regions corresponding to the division lines, and plasma-etching the wafer processed by the masking to thereby divide the wafer into the individual devices along the division lines.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.