Illumination system and lithographic apparatus

US9116439B2 · kind B2 · utility

Assignees

• ASML NETHERLANDS B.V. · NL
• Carl Zeiss SMT GmbH · DE

Inventors

• Heine Melle Mulder · Veldhoven, NL
• Steven George Hansen · Phoenix, US
• Johannes Catharinus Hubertus Mulkens · Valkenswaard, NL
• Markus Deguenther · Aalen, DE

Key dates

• Filing date: Mar 18, 2011
• Grant date: Aug 25, 2015
• Expiry date: Feb 28, 2033

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70116
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.