Apparatus and method for calculating a wafer position in a processing chamber under process conditions
US9117866B2 · kind B2 · utility
488Cited by
205References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2012 |
| Grant date | Aug 25, 2015 |
| Priority date | — |
| Expiry date | May 29, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67259
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for processing a wafer including a reaction chamber having a reaction space for processing the wafer, a susceptor positioned within the reaction chamber and having a sidewall, at least one light source positioned outside of the reaction space, at least one window in the reaction chamber, and wherein the at least one light source is directed through the at least one window to contact the sidewall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.