Chamber matching for power control mode
US9119283B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 23, 2013 |
| Grant date | Aug 25, 2015 |
| Priority date | — |
| Expiry date | Nov 28, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods for performing chamber matching are described. One of the methods for performing chamber matching includes executing a first test within a first plasma chamber to measure a variable and executing a second test within a second plasma chamber to measure the variable. The first and second tests are executed based on one recipe. The method further includes determining a first relationship between the variable measured with the first test and power provided during the first test, determining a second relationship between the variable measured with the second test and power provided during the second test, and identifying power adjustment to apply to the second plasma chamber during a subsequent processing operation based on the first and second relationships. The power adjustment causes the second plasma chamber to perform the processing operation in a processing condition determined using the first plasma chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.