Patent · US Active

Apparatus for wafer grinding

US9120194B2 · kind B2 · utility

0Cited by
11References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 21, 2011
Grant dateSep 1, 2015
Priority date
Expiry dateFeb 19, 2034

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24D7/14
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A grinding wheel comprises an outer base with a first attached grain pad; and an inner frame with a second attached grain pad; and a spindle axis shared by the outer base and the inner frame, wherein at least one of the outer base and the inner frame can move independently along the shared spindle axis; and wherein the outer base, the inner frame, and the shared spindle axis all have a same center. A grinding system comprises an above said grinding wheel, and a wheel head attached to the shared spindle axis, capable of moving vertically, in addition to a motor driving the grinding wheel to spin; and a chuck table for fixing a wafer on top of the chuck table; wherein the grinding wheel overlaps a portion of the chuck table, each capable of spinning to the opposite direction of another.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.