Process kit and target for substrate processing chamber
US9127362B2 · kind B2 · utility
356Cited by
272References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2006 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | May 4, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68735
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.