Inventor · Oakland, CA, US

Adolph Miller Allen

42Patents
6h-index
110Co-inventors
72Inventor score

Filing activity: Jul 14, 1997 → Aug 25, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9127362B2 Process kit and target for substrate processing chamber Electricity 356 Active
USD797067S1 Target profile for a physical vapor deposition chamber target General 335 Active
US9460959B1 Methods for pre-cleaning conductive interconnect structures Mechanical Engineering; Lighting; Heating 113 Active
USD825504S1 Target profile for a physical vapor deposition chamber target General 31 Active
US5894381A Low mass sectioned load beam of head gimbal assembly having increased high first torsion frequency mode Physics 23 Expired
US10347475B2 Holding assembly for substrate processing chamber Electricity 6 Active
US9909206B2 Process kit having tall deposition ring and deposition ring clamp Electricity 6 Active
US7422664B2 Method for plasma ignition Electricity 5 Expired
US11037768B2 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Electricity 3 Active
US9991101B2 Magnetron assembly for physical vapor deposition chamber Electricity 2 Active
US10972280B2 Blockchain for distributed authentication of hardware operating profile Electricity 2 Active
US8968536B2 Sputtering target having increased life and sputtering uniformity Electricity 2 Active
US11289312B2 Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability Electricity 2 Active
US10811257B2 Techniques for forming low stress etch-resistant mask using implantation Electricity 1 Active
US9343664B2 Pattern fortification for HDD bit patterned media pattern transfer Physics 1 Active
US11049701B2 Biased cover ring for a substrate processing system Electricity 1 Active
US7829456B2 Method to modulate coverage of barrier and seed layer using titanium nitride Electricity 1 Active
US11810770B2 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Electricity 1 Active
US10563304B2 Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers Electricity 1 Active
US10763090B2 High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process Electricity 1 Active
US11586160B2 Reducing substrate surface scratching using machine learning Physics 1 Active
US11473189B2 Method for particle removal from wafers through plasma modification in pulsed PVD Electricity 1 Active
US9499901B2 High density TiN RF/DC PVD deposition with stress tuning Electricity 1 Active
US12136544B2 Etch uniformity improvement for single turn internal coil PVD chamber Electricity 0 Active
US9660185B2 Pattern fortification for HDD bit patterned media pattern transfer Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.